The State Key Laboratory for Surface Physics, as one of the first-group of state key laboratories, was approved under the auspices of the State Development Planning Commission of China in 1984. It was established jointly by the Institute of Physics (IOP) and the Institute of Semiconductors (IOS). In 1987, it was officially opened to scientists in from China and abroad. The lab is located at IOP with the IOS Division as a constitutional part of the lab.

Research direction

The current research areas of the lab at IOS include fundamental research on thin film solar energy materials and solar cells, and rare-earth element doped Si-based light-emitting materials and devices. Specifically, the research directions of the lab include:

Mechanism for the light-induced degradation of a Si, high-rate deposition of diphasic Si-based films and solar cells.

Photochemical hydrogen generation.

Si-based solar cells on polymer substrates with a high specific power for space application.

Quantum confinement effects and optical characteristics of Si nanodots and nanowires.

Optoelectronic properties and microstructures of rare-earth element doped Si and III-V semiconductors.

Research Equipment

The major equipment of the lab is housed in IOP, while that installed at IOS includes plasma enhanced CVD, a multi-functional magnetic sputtering system, a rapid thermal annealing system and optical/electrical characterization facilities for thin films and devices.

1 KYKY-500K Multi-function RF Magnetic Controlled Sputtering System

2 PECVD-310 Plasma Enhanced Chemical Vapor Deposition System